Web不平度检测,non-flatness measurement 1)non-flatness measurement不平度检测 1.A novel in-situ non-flatness measurement method of wafer chuck in step-and-scan projection lithographic tool is presented.提出一种步进扫描投影光刻机承片台不平度检测新技术。 2)parallelism detection平行度检测 Webflatness measurements a wafer chuck was mounted on the test mount. FIGURE 3. Flatness error of a 200 mm silicon wafer on a ceramic pin vacuum chuck measured with …
Exposure tool chuck flatness study and effects on lithography
http://www.benchmarktech.com/phaseshiftfocusmonitor WebThe PSFM reticle allows rapid characterization of several types of focus errors, to evaluate the effects of the stepper lens, autofocus and auto-leveling subsystems and wafer chuck flatness, The PSFM reticle has also been used to identify process-induced focus errors. PSFM Applications Measure focus, tilt, curvature, astigmatism, and IFD grams into milliliters
Reduction of edge defocus by modification of chuck shape on …
WebThe flatness of the chuck on the stepper or scanner is critical to obtain good patterning performance especially in the sub quarter micron regime. In this study an attempt has … WebMay 17, 2005 · Wafer flatness is studied to investigate the cause of this defocus. The chuck shape is the key to avoid to defocusing at these two positions. Modification of chuck shape can reduce yield loss. Edge defocus can be reduced by several techniques on a Nikon S204 scanner. By using main software MCSV version 3.44 or above, as well as … WebApr 1, 2006 · Preliminary analysis indicates that a chuck flatness of about 50nm within the quality area of the mask can be realized with an optimized optics manufacturing technology. Yet, there are... grams in to kgs